(Color online) Scheme of experimental setups. (a) microplasma post-treatment and (b) microplasma-assisted FEBID (not to scale).
(Color online) EDXS measured composition of the deposits as a function of irradiation time. (Flow rate of , input , and applied bias on .) Treatment time corresponds to an as-prepared FEB deposit (5 keV, 1 nA) from precursor.
(Color online) Composition of the FEB deposits after microplasma postirradiation for 30 min as a function of applied bias potential on the substrate (flow rate of , input ). The right axis indicates the atomic contents of Cu, C, O, and F in the as-prepared FEB deposits from .
(Color online) Schematic principle of ion induced chemical sputtering for microplasma irradiation on samples with an attractive bias potential.
SEM images of microplasma-assisted FEB deposits. Top view of deposits (a) with and (b) without shielding of the electromagnetic field. 60° tilt images of dot deposits fabricated (c) by microplasma-assisted FEBID and (d) by conventional FEBID process.
60° tilt SEM images of microplasma-assisted FEB dot deposits (exposure 30 min, 30 keV, 1 nA) fabricated with substrate bias potentials of (a) −30 V and (b) . The flow rates were of and ; the input power was 12 W.
(Color online) (a) Cross sectional SEM image of a microplasma-assisted FEB dot deposit fabricated in 90 min and (b) top view optical microscope image of the radial halo deposit showing interference colors due to thickness variations. The position of the plasma torch and the gas injection nozzle are indicated.
(Color online) Composition of the microplasma-assisted FEB deposits as a function of applied bias on the substrate. The right axis indicates the atomic contents of Cu, C, O, and F in as-prepared deposits from obtained under similar FEB exposure conditions.
Experimental conditions for microplasma post-treatment. The unit sccm stands for cubic centimeter per minute.
Experimental conditions for microplasma-assisted FEBID.
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