1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
High-aspect-ratio deep Si etching in plasma. II. Mechanism of lateral etching in high-aspect-ratio features
Rent:
Rent this article for
USD
10.1116/1.3466884
/content/avs/journal/jvstb/28/4/10.1116/1.3466884
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/4/10.1116/1.3466884
/content/avs/journal/jvstb/28/4/10.1116/1.3466884
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvstb/28/4/10.1116/1.3466884
2010-07-28
2014-10-31
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High-aspect-ratio deep Si etching in SF6/O2 plasma. II. Mechanism of lateral etching in high-aspect-ratio features
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/4/10.1116/1.3466884
10.1116/1.3466884
SEARCH_EXPAND_ITEM