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Pyrolysis of two-dimensional and three-dimensional interferometrically patterned resist structures
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10.1116/1.3495756
/content/avs/journal/jvstb/28/6/10.1116/1.3495756
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3495756
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic diagrams indicating the exposure geometry used to create (a) 1D gratings, (b) a 2D rectangular array of holes, (c) a tilted 1D grating, and (d) a 3D fcc structure.

Image of FIG. 2.
FIG. 2.

SEM images of resist structures created with IL: (a) 1D gratings, (b) a high aspect ratio 2D rectangular array of holes, (c) high aspect ratio tilted 2D array of holes, and (d) a 3D fcc structure.

Image of FIG. 3.
FIG. 3.

SEM images of pyrolyzed resist structures created with IL: (a) 1D gratings, (b) a low aspect ratio 2D rectangular array of holes, (c) high aspect ratio 2D rectangular array of holes, and (d) a 3D fcc structure.

Image of FIG. 4.
FIG. 4.

(Color online) (a) SEM image of pyrolyzed carbon growth mask on sapphire substrate (b) cross-section SEM image of a pyramidal single crystal GaN structure grown through pyrolyzed carbon mask, (c) top-down SEM image of GaN crystals growing through carbon growth mask prior to coalescence showing aligned crystal planes (registration to substrate), and good selectivity.

Image of FIG. 5.
FIG. 5.

(a) 3D porous carbon electrode (b) 3D carbon matrix decorated with electro-deposited Ag nanoparticles, and (c) 3D carbon matrix with Ag NPs coated with Pd in an electroless deposition process.

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/content/avs/journal/jvstb/28/6/10.1116/1.3495756
2010-10-28
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pyrolysis of two-dimensional and three-dimensional interferometrically patterned resist structures
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3495756
10.1116/1.3495756
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