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UV ozone passivation of the metal/dielectric interface for -based organic thin film transistors
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10.1116/1.3498744
/content/avs/journal/jvstb/28/6/10.1116/1.3498744
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3498744
/content/avs/journal/jvstb/28/6/10.1116/1.3498744
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/content/avs/journal/jvstb/28/6/10.1116/1.3498744
2010-10-13
2014-12-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: UV ozone passivation of the metal/dielectric interface for HfO2-based organic thin film transistors
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3498744
10.1116/1.3498744
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