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Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research
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10.1116/1.3498757
/content/avs/journal/jvstb/28/6/10.1116/1.3498757
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3498757

Figures

Image of FIG. 1.
FIG. 1.

(Color) Schematic depiction of the various actinic mask inspection techniques, arranged by category, roughly in the chronological order in which they came into operation. In each case, the mask is illuminated with EUV light. Some systems detect EUV photons directly [(a), (e), (f), (g), (j), and (k)], others detect photoelectrons [(c) and (d)] or convert the EUV or photoelectron image to visible-light [(b), (h), and (i)].

Tables

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TABLE I.

EUV actinic mask inspection and imaging projects.

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/content/avs/journal/jvstb/28/6/10.1116/1.3498757
2010-11-18
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3498757
10.1116/1.3498757
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