Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography method
(Color online) Fabrication procedure of silicon template by diblock-copolymer self-assembly.
[(a)–(c)] Top view and (d) tilted view SEM images of silicon template made by diblock-copolymer self-assembly.
(Color online) Fabrication procedure of SERS device by nanoimprint lithography.
Tilted view SEM images of PMMA imprint made by nanoimprint lithography.
Top down SEM images of Au nanodot SERS device (a) before lift-off and [(b)–(d)] after lift-off.
(Color online) (a) Amplitude and (b) height AFM measurements of Au nanodot SERS device.
(Color online) Raman scattering plots of R6G on (a) device chip—patterned section, (b) control chip—bare silicon, and (c) device chip—bare silicon section. Black arrows denote R6G scattering peaks.
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