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Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography method
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10.1116/1.3501341
/content/avs/journal/jvstb/28/6/10.1116/1.3501341
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3501341
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Fabrication procedure of silicon template by diblock-copolymer self-assembly.

Image of FIG. 2.
FIG. 2.

[(a)–(c)] Top view and (d) tilted view SEM images of silicon template made by diblock-copolymer self-assembly.

Image of FIG. 3.
FIG. 3.

(Color online) Fabrication procedure of SERS device by nanoimprint lithography.

Image of FIG. 4.
FIG. 4.

Tilted view SEM images of PMMA imprint made by nanoimprint lithography.

Image of FIG. 5.
FIG. 5.

Top down SEM images of Au nanodot SERS device (a) before lift-off and [(b)–(d)] after lift-off.

Image of FIG. 6.
FIG. 6.

(Color online) (a) Amplitude and (b) height AFM measurements of Au nanodot SERS device.

Image of FIG. 7.
FIG. 7.

(Color online) Raman scattering plots of R6G on (a) device chip—patterned section, (b) control chip—bare silicon, and (c) device chip—bare silicon section. Black arrows denote R6G scattering peaks.

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/content/avs/journal/jvstb/28/6/10.1116/1.3501341
2010-12-01
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography method
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3501341
10.1116/1.3501341
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