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Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch
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10.1116/1.3507427
/content/avs/journal/jvstb/28/6/10.1116/1.3507427
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3507427
/content/avs/journal/jvstb/28/6/10.1116/1.3507427
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/content/avs/journal/jvstb/28/6/10.1116/1.3507427
2010-12-02
2015-03-04
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3507427
10.1116/1.3507427
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