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High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors
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10.1116/1.3511790
/content/avs/journal/jvstb/28/6/10.1116/1.3511790
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3511790
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Chemical structures of NBnHPF, NBnDCh, and C4MR.

Image of FIG. 2.
FIG. 2.

DUV (248 nm) contrast curves for NBnHPF.00, NBnHPF.10, NBnDCh.00, and NBnDCh.20.

Image of FIG. 3.
FIG. 3.

DUV (248 nm) contrast curves for NBnHPF.20 and NBnHPF.25.

Image of FIG. 4.
FIG. 4.

Conversion of NBn groups for NBnHPF.20 and NBnDCh.00, and a fit of the data using a Dill C model.

Image of FIG. 5.
FIG. 5.

Inhibitor loading at the point of solubility transition for the different formulations of NBnHPF and NBnDCh.

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/content/avs/journal/jvstb/28/6/10.1116/1.3511790
2010-11-30
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3511790
10.1116/1.3511790
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