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Quantifying reaction spread and x-ray exposure sensitivity in hydrogen silsesquioxane latent resist patterns with x-ray spectromicroscopy
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10.1116/1.3514124
/content/avs/journal/jvstb/28/6/10.1116/1.3514124
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3514124
/content/avs/journal/jvstb/28/6/10.1116/1.3514124
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/content/avs/journal/jvstb/28/6/10.1116/1.3514124
2010-11-29
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Quantifying reaction spread and x-ray exposure sensitivity in hydrogen silsesquioxane latent resist patterns with x-ray spectromicroscopy
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/28/6/10.1116/1.3514124
10.1116/1.3514124
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