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High verticality InP/InGaAsP etching in inductively coupled plasma for photonic integrated circuits
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10.1116/1.3522659
/content/avs/journal/jvstb/29/1/10.1116/1.3522659
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/1/10.1116/1.3522659
/content/avs/journal/jvstb/29/1/10.1116/1.3522659
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/content/avs/journal/jvstb/29/1/10.1116/1.3522659
2011-01-05
2014-09-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High verticality InP/InGaAsP etching in Cl2/H2/Ar inductively coupled plasma for photonic integrated circuits
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/1/10.1116/1.3522659
10.1116/1.3522659
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