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SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithographya)
a)This paper was presented at the 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication Conference, Anchorage, Alaska, 1–4 June 2010.7
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10.1116/1.3554404
/content/avs/journal/jvstb/29/2/10.1116/1.3554404
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/2/10.1116/1.3554404
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/content/avs/journal/jvstb/29/2/10.1116/1.3554404
2011-02-14
2014-08-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithographya)
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/2/10.1116/1.3554404
10.1116/1.3554404
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