(a) Silver films on substrate A after being etched for 2 h. (b) The silver particles at the bottom of the nanowires. (c) Cross-section view of the Ag removed nanowires of substrate A etched for 2 h. (d) The top view of substrate A etched for 3 h. (e) The top view of substrate B etched for 0.5 h and (f) for 3 h.
(Color online) Relationship of Si nanowire arrays length versus etching duration. The red dotted line is the linear fit relationship.
(Color online) (a) and (b) Reflectance of substrates A and B etched for different times, respectively.
(Color online) (a) Transmission and absorption of substrate A etched for 4 h and pyramids textured Si. (b) The reflectance of nanowire arrays on substrate A in 300–1600 nm wavelengths.
(Color online) (a) Normalized value of , , FF and for different Groups sample. (b) The comparison of IQE of Groups C and D. (c) The comparison of IQE of Groups E, F, and G.
Group samples with different fabrication processes.
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