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In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography
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10.1116/1.3613697
/content/avs/journal/jvstb/29/4/10.1116/1.3613697
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/4/10.1116/1.3613697
/content/avs/journal/jvstb/29/4/10.1116/1.3613697
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/content/avs/journal/jvstb/29/4/10.1116/1.3613697
2011-08-11
2014-08-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam–direct-write lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/4/10.1116/1.3613697
10.1116/1.3613697
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