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Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film
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10.1116/1.3622301
/content/avs/journal/jvstb/29/5/10.1116/1.3622301
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/5/10.1116/1.3622301
/content/avs/journal/jvstb/29/5/10.1116/1.3622301
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/content/avs/journal/jvstb/29/5/10.1116/1.3622301
2011-08-15
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/5/10.1116/1.3622301
10.1116/1.3622301
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