1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection
Rent:
Rent this article for
USD
10.1116/1.3634020
/content/avs/journal/jvstb/29/6/10.1116/1.3634020
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3634020
/content/avs/journal/jvstb/29/6/10.1116/1.3634020
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvstb/29/6/10.1116/1.3634020
2011-09-27
2014-12-22
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3634020
10.1116/1.3634020
SEARCH_EXPAND_ITEM