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Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection
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10.1116/1.3634020
/content/avs/journal/jvstb/29/6/10.1116/1.3634020
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3634020
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Figures

Image of FIG. 1.
FIG. 1.

Technique used to measure linewidths: (a) enhanced backscattered electron signal from tungsten coated lines, (b) a typical 40 nm period grating, (c) intensity profile obtained for the 40 nm period grating shown in (b).

Image of FIG. 2.
FIG. 2.

Relationship between the measured line size and exposure dose for development using 25% TMAH at temperatures of 23 and 45 °C, 0.26 N TMAH, and a two step development process involving an HF dip. Results for 40 nm period lines are shown as closed symbols and those for isolated lines as open symbols.

Image of FIG. 3.
FIG. 3.

Relationship between the measured line size and exposure dose for development using 0.26 N TMAH with and without 4% NaCl. Also shown are the results of development using 1% NaOH with 4% NaCl. Results for 40 nm period lines are shown as closed symbols and those for isolated lines as open symbols.

Image of FIG. 4.
FIG. 4.

Backscattered images and corresponding image intensity scans across lines obtained for development using 1% NaOH with 4% NaCl. Each scan was obtained from lines written at different exposure dose and this increases toward the bottom.

Image of FIG. 5.
FIG. 5.

Relationship between the thickness of HSQ lines and measured linewidths. Results are shown for the developers: 25% TMAH, 0.26 N TMAH, and 1% NaOH with 4% NaCl.

Image of FIG. 6.
FIG. 6.

Effect of delaying development of substrates after electron beam exposure. Measurements are for 40 nm period lines.

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/content/avs/journal/jvstb/29/6/10.1116/1.3634020
2011-09-27
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3634020
10.1116/1.3634020
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