1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures
Rent:
Rent this article for
USD
10.1116/1.3643761
/content/avs/journal/jvstb/29/6/10.1116/1.3643761
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3643761
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Process sequence based on three different generic processes subsequently applied for the generation of mixed 3D pattern: combining thermal NIL, grey-scale e-beam exposure, and reflow allows a selective transformation of stepped sidewalls into smooth slopes while imprinted surface pattern stays unaffected.

Image of FIG. 2.
FIG. 2.

Prepatterning of a 1 μm thick PMMA layer with a molecular weight of 120 kg/mol was accomplished by thermal NIL. The polymer layer on silicon is imprinted on a large area with a binary nanograting (height, width, and distance: 250 nm). During sample cleaving, the resist is distorted and hence slightly detached from the substrate (scale bar: 1 μm).

Image of FIG. 3.
FIG. 3.

Normalized dose–depth correlations (contrast curve) are plotted for 1 μm thick PMMA with 120 kg/mol (NIL resist) and 950 kg/mol (standard EBL resist) on silicon. The e-beam exposure was performed at 100 keV/1 nA and the development was accomplished in undiluted MIBK at 20 °C for 30 s. Since the contrast curves exhibit comparable slope characteristics, a grey-scale EBL can also be applied to the NIL resist.

Image of FIG. 4.
FIG. 4.

Exemplary mixed 3D pattern was manufactured by combining NIL, grey-scale EBL, and thermal postprocessing (a). The PMMA structures consist of a binary 250 nm line grating on top of a 1 μm thick resist with vertical and sloped sidewalls with an inclination ∼ 30° (b) (scale bar: 2 μm).

Image of FIG. 5.
FIG. 5.

SEM micrograph of an exemplary mixed 3D structure in PMMA resist intended for optical application for backlight display devices. The resist pattern is generated by grey-scale EBL onto an NIL prepatterned resist (a). The selective melting of exposed areas eventually integrates prisms with smooth surfaces into the imprinted line grating (b) (scale bar: 2 μm).

Image of FIG. 6.
FIG. 6.

SEM micrograph of an OrmoStamp mold (a), replicated from the PMMA master pattern, shows the inverse pattern polarity. Used as a working stamp, it allows a repeated generation of mixed 3D structure by replication techniques (b) (scale bar: 2 μm).

Loading

Article metrics loading...

/content/avs/journal/jvstb/29/6/10.1116/1.3643761
2011-09-27
2014-04-21
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3643761
10.1116/1.3643761
SEARCH_EXPAND_ITEM