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Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications
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10.1116/1.3646481
/content/avs/journal/jvstb/29/6/10.1116/1.3646481
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3646481
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) (a) Pictures and (b) 30 × 30 µm2 AFM images of the carbon films below (left) and above (right) the Ni template, obtained from a sample with annealing temperature of 1100 °C.

Image of FIG. 2.
FIG. 2.

Raman spectra of carbon films underneath Ni templates obtained under annealing temperatures of 800, 1000, and 1100 °C.

Image of FIG. 3.
FIG. 3.

Raman spectra of the carbon films obtained after single and double Ni deposition/1100 °C annealing/Ni removal procedures.

Image of FIG. 4.
FIG. 4.

(Color online) (a) Fabrication procedure for selective carbon film deposition, and (b) pictures of the sample before (left) and after (right) Ni removal taken by optical microscopy.

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/content/avs/journal/jvstb/29/6/10.1116/1.3646481
2011-10-07
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3646481
10.1116/1.3646481
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