Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications
(Color online) (a) Pictures and (b) 30 × 30 µm2 AFM images of the carbon films below (left) and above (right) the Ni template, obtained from a sample with annealing temperature of 1100 °C.
Raman spectra of carbon films underneath Ni templates obtained under annealing temperatures of 800, 1000, and 1100 °C.
Raman spectra of the carbon films obtained after single and double Ni deposition/1100 °C annealing/Ni removal procedures.
(Color online) (a) Fabrication procedure for selective carbon film deposition, and (b) pictures of the sample before (left) and after (right) Ni removal taken by optical microscopy.
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