(Color online) Scheme of the samples preparation process. Arrays of hydrophilic features with different shape and orientation are patterned by nanoimprint lithography on HMDS passivated substrates.
SEM image of the HSQ features on the molds. Different shapes—triangles (a) and rectangles (b)—are patterned on the same mold. The features height is about 100 nm.
(Color online) (a) Topography AFM image in dry conditions of imprinted 950 K PMMA after 30 s oxygen plasma. The reduced features depth (it is shown to be 25 nm instead of the expected 100 nm) is the result of the AFM tip size being bigger than the size of the features, making it not able to reach the substrate at the bottom of the imprinted layer. (b) Topography AFM image under liquid conditions of the HMDS template. The actual thickness of the HMDS layer is probably increased by imaging in liquid.
(Color online) Topography AFM image under liquid conditions of the HMDS template with attached triangular DNA origami. All binding sites are occupied and no nonspecific binding is observed. The height profile across a DNA origami triangle corresponds to the thickness of a single DNA duplex (∼ 2 nm).
(Color online) Phase AFM image under liquid conditions of the HMDS template with attached rectangular DNA origami. The signal shows the contrast between the DNA origami soft surface and the substrate hard surface.
(Color online) AFM image under dry conditions of the HMDS template with attached triangular DNA origami. Some defects are visible due to the presence of salt precipitate.
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