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Selective placement of DNA origami on substrates patterned by nanoimprint lithography
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10.1116/1.3646900
    + View Affiliations - Hide Affiliations
    Affiliations:
    1 Columbia University, Department of Applied Physics and Applied Mathematics, 200 Mudd Building, 500 West 120th Street, New York, New York 10027
    2 Columbia University, Department of Applied Physics and Applied Mathematics & Department of Chemistry, 200 Mudd Building, 500 West 120th Street, New York, New York 10027
    3 Columbia University, Department of Applied Physics and Applied Mathematics & Department of Mechanical Engineering, 200 Mudd Building, 500 West 120th Street, New York, New York 10027
    4 Columbia University, Department of Applied Physics and Applied Mathematics, 200 Mudd Building, 500 West 120th Street, New York, New York 10027
    a) Electronic mail: sw2128@columbia.edu
    J. Vac. Sci. Technol. B 29, 06F205 (2011); http://dx.doi.org/10.1116/1.3646900
/content/avs/journal/jvstb/29/6/10.1116/1.3646900
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3646900
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) Scheme of the samples preparation process. Arrays of hydrophilic features with different shape and orientation are patterned by nanoimprint lithography on HMDS passivated substrates.

Image of FIG. 2.
FIG. 2.

SEM image of the HSQ features on the molds. Different shapes—triangles (a) and rectangles (b)—are patterned on the same mold. The features height is about 100 nm.

Image of FIG. 3.
FIG. 3.

(Color online) (a) Topography AFM image in dry conditions of imprinted 950 K PMMA after 30 s oxygen plasma. The reduced features depth (it is shown to be 25 nm instead of the expected 100 nm) is the result of the AFM tip size being bigger than the size of the features, making it not able to reach the substrate at the bottom of the imprinted layer. (b) Topography AFM image under liquid conditions of the HMDS template. The actual thickness of the HMDS layer is probably increased by imaging in liquid.

Image of FIG. 4.
FIG. 4.

(Color online) Topography AFM image under liquid conditions of the HMDS template with attached triangular DNA origami. All binding sites are occupied and no nonspecific binding is observed. The height profile across a DNA origami triangle corresponds to the thickness of a single DNA duplex (∼ 2 nm).

Image of FIG. 5.
FIG. 5.

(Color online) Phase AFM image under liquid conditions of the HMDS template with attached rectangular DNA origami. The signal shows the contrast between the DNA origami soft surface and the substrate hard surface.

Image of FIG. 6.
FIG. 6.

(Color online) AFM image under dry conditions of the HMDS template with attached triangular DNA origami. Some defects are visible due to the presence of salt precipitate.

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/content/avs/journal/jvstb/29/6/10.1116/1.3646900
2011-11-03
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Selective placement of DNA origami on substrates patterned by nanoimprint lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3646900
10.1116/1.3646900
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