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Multilayer infrared metamaterial fabrication using membrane projection lithography
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View: Figures


Image of FIG. 1.
FIG. 1.

(Color online) Schematic depiction of membrane projection lithography process flow.

Image of FIG. 2.
FIG. 2.

(Color online) (a) SEM image of a single layer of double gap resonators on a single wall of the unit cell. The obvious difference in lateral cell dimensions (L ≠ W) is due to incomplete cross-linking and subsequent box relaxation. (b) Raw normal incidence FTIR transmission measurement of the double gap resonator for the two polarizations shown in the SEM image (inset). Spectral response of SU-8 measured using spectroscopic ellipsometry.

Image of FIG. 3.
FIG. 3.

(Color online) (a) Schematic of multilayer MPL process flow. (b) Cross-section SEM image of the first layer of unit cells after SU-8 backfill/planarization. (c) Second layer of SU-8 unit cells.

Image of FIG. 4.
FIG. 4.

(Color online) Optical micrograph of a photoresist membrane patterned with contact lithography. The underlying unit cell structure is apparent through the film.

Image of FIG. 5.
FIG. 5.

SEM images showing multilayer MPL structures decorated using contact lithography.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Multilayer infrared metamaterial fabrication using membrane projection lithography