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Recessed area patterning via nanoimprint lithography
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10.1116/1.3660393
/content/avs/journal/jvstb/29/6/10.1116/1.3660393
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3660393
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic diagram describing the sequential nanoimprinting process which is used to fabricate the three-dimensional polymer templates via nanoimprint lithography. (a),(b) A silicon master mold with micron-sized dimensions was used to imprint primary features onto the polymer template. (c),(d) A secondary imprint process was performed on top of the primary features with a secondary silicon master mold to fabricate smaller features on the protrusion of the primary features.

Image of FIG. 2.
FIG. 2.

(Color online) Schematic describing recessed area imprinting to create multiple features in a particular polymer.

Image of FIG. 3.
FIG. 3.

Scanning electron microscopy image of three-dimensional ETFE polymer template (a) after the primary imprinting process with a 2 μm line and space grating (b) after the secondary imprinting process where the secondary master mold (250 nm line and space grating) was oriented perpendicular to the primary grating (c) after the secondary imprinting process where the secondary master mold was oriented parallel to the primary grating.

Image of FIG. 4.
FIG. 4.

Scanning electron microscopy image of patterns obtained from a direct recessed area imprint of PMMA with an ETFE template. (a) Image showing large area uniformity (b) Image showing the presence of features (line and space) in the recessed areas of the patterns.

Image of FIG. 5.
FIG. 5.

Scanning electron microscopy image of patterns obtained from a direct recessed area imprint of SU8 with an ETFE template (a) Image showing the presence of features (line and space) in the recessed areas of the patterns (b) Image showing the presence of holes in the recessed areas of the patterns.

Image of FIG. 6.
FIG. 6.

Cross-section scanning electron microscopy image of patterns obtained from a direct recessed area imprint of PMMA with an ETFE template.

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/content/avs/journal/jvstb/29/6/10.1116/1.3660393
2011-11-11
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Recessed area patterning via nanoimprint lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3660393
10.1116/1.3660393
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