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Lithography-patterning-fidelity-aware electron-optical system design optimization
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10.1116/1.3662402
/content/avs/journal/jvstb/29/6/10.1116/1.3662402
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3662402

Figures

Image of FIG. 1.
FIG. 1.

(a) Traditional EOS design optimization flow. (b) Proposed patterning-fidelity-aware optimization flow.

Image of FIG. 2.
FIG. 2.

(Color online) Single-gate EOS and design parameters.

Image of FIG. 3.
FIG. 3.

Patterning simulation flow.

Image of FIG. 4.
FIG. 4.

Electron source simulation flow.

Image of FIG. 5.
FIG. 5.

(Color online) Boundary of the electron source tip and the meshing error of FEM.

Image of FIG. 6.
FIG. 6.

(Color online) (a) Electron distribution at the plane of the electron source tip. (b) Electron distribution at the wafer plane.

Image of FIG. 7.
FIG. 7.

(Color online) (a) Electron distribution after applying traditional optimization. (b) Electron distribution after applying the proposed patterning-fidelity-aware optimization. The central circles indicate the defined ranges of B ss.

Image of FIG. 8.
FIG. 8.

(Color online) Comparison of developed resist patterns before and after applying the proposed patterning-fidelity-aware optimization.

Tables

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TABLE I.

Original words and corresponding abbreviated words.

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TABLE II.

Details of the simplified EOS design.

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TABLE III.

Optimal results of the EOS design according to FPs.

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TABLE IV.

Optimal results of the proposed EOS design method.

Generic image for table
TABLE V.

Comparison of critical dimensions before and after applying the proposed patterning-fidelity-aware optimization.

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/content/avs/journal/jvstb/29/6/10.1116/1.3662402
2011-12-07
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Lithography-patterning-fidelity-aware electron-optical system design optimization
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/29/6/10.1116/1.3662402
10.1116/1.3662402
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