(Color online) Schematic diagram of optical proximity correction. (A) Target design with SRAF inserted, (B) fragmentation locations, (C) contour showing initial simulation result, (D) contour after moving fragments according to result of first iteration of simulation.
(Color online) Example of a plot with triangles showing absolute value of CD error (simulated – measured) for a variety of 1D and 2D measurement locations. The bars correspond to the 95% confidence interval associated with the measurement of the CD. Solid filled triangles correspond to different types of features. For most cases, the model error is less than the 95% confidence interval for the measurements.
(Color online) Example of mask CD variation through pitch for various space CD targets before (A) and after (B) the application of a mask proximity correction model.
(Color online) Contour plot of CD difference RMS for multiple simulation locations for models comprised of various number of kernels and optical diameter. Reference model used 4.3 μm optical diameter and 512 kernels.
(Color online) Example plot of model error for 1D (A and B) and 2D (C and D) for a constant threshold aerial image model (A and C) and a full resist model (B and D). Note differing y-axis scale values for 1D and 2D.
(Color online) Example plot of model error RMS for various focus and exposure conditions. Model was calibrated at dose = Nom and focus = 0. Model fitness was then characterized for various defocus and exposure conditions.
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