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Structural characterization of He ion microscope platinum deposition and sub-surface silicon damage
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View: Figures


Image of FIG. 1.
FIG. 1.

HAADF STEM image of two 200 × 200 nm2 Pt pillars, deposited at ion beam current of 0.35 pA, which resulted in a 1.81 μm high pillar (left), and 0.1 pA, which resulted in a 954 nm high pillar (right).

Image of FIG. 2.
FIG. 2.

BF TEM image of the sub surface He+ ion interaction zone below the HIM Pt deposited pillar by 0.35 pA. The amorphous region contains nano He bubbles.

Image of FIG. 3.
FIG. 3.

High magnification BF TEM image of the over-spray of the large pillar (taken from the right side of the pillar presented in Fig. 2); there is about 200 nm of lateral overspray with height of less than 40 nm.

Image of FIG. 4.
FIG. 4.

BF TEM images taken from (a) the bottom, (b) the middle, and (c) the top sections of the 0.35 pA deposited pillar.

Image of FIG. 5.
FIG. 5.

(a) High magnification BF image taken from below the amorphization region of the 0.35 pA deposited Pt pillar. FFT from the three defined boxes in (a) were taken: in the nano-bubbles region (b), at the transition layer (c), and below the transition layer (d).

Image of FIG. 6.
FIG. 6.

HAADF STEM images taken from below the Pt pillars and present different amorphization depth of 253 nm for the 0.35 pA deposition current (a) and 196 nm for the 0.1 pA deposition current (b). In both cases the nano-bubble concentration decreases with depth (white arrows).

Image of FIG. 7.
FIG. 7.

(Color online) TEM EDS point measurements taken along the deposited Pt pillars; (a) and (b) present the point locations and (c) and (d) present the composition analysis for the 0.35 pA and 0.1 pA deposition currents, respectively.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Structural characterization of He ion microscope platinum deposition and sub-surface silicon damage