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Ge concentrations in pile-up layers of sub-100-nm SiGe films for nano-structuring by thermal oxidation
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10.1116/1.4736982
/content/avs/journal/jvstb/30/4/10.1116/1.4736982
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/4/10.1116/1.4736982
/content/avs/journal/jvstb/30/4/10.1116/1.4736982
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/content/avs/journal/jvstb/30/4/10.1116/1.4736982
2012-07-10
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ge concentrations in pile-up layers of sub-100-nm SiGe films for nano-structuring by thermal oxidation
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/4/10.1116/1.4736982
10.1116/1.4736982
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