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Outgassing and photochemical studies of photosensitive films upon irradiation at 13.5 nm
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10.1116/1.4739000
/content/avs/journal/jvstb/30/5/10.1116/1.4739000
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/5/10.1116/1.4739000

Figures

Image of FIG. 1.
FIG. 1.

(Color online) 10″ OD vacuum system for evaluating resist outgassing. A, 10″ OD main chamber: A1, electrostatic lens assembly and QMS; A2, linear motion; A3, samples and holder; A4, TMP(STP-451); A5, pneumatic valve; A6, 6″ gate valve. B, load-lock system: B1, XY stage; B2, Z motion; B3, isolation gate valve to TMP (V81-T). C, gas preparation sub-chamber: C1, N2 gas; C2, pressure manometer (1.0 torr); C3, pressure manometer (0.1 torr); C4, isolation gate valve to TMP (V-1001); C5, gas leak valve; C6, on-off bellows valves.

Image of FIG. 2.
FIG. 2.

(Color online) (a) Absolute outgassing rate of a 125 nm PMMA film scaled to an irradiance of 15 mW cm−2. (b) Difference in the outgassing rate from a 100 nm PMMA film relative to that from a 125 nm PMMA film. (c)Difference in the outgassing rate from an 80 nm PMMA film relative to that from a 125 nm PMMA film. In (b) and (c), the solid and dashed blocks indicate the major and minor features of outgassing, respectively.

Image of FIG. 3.
FIG. 3.

(Color online) (a) Absolute outgassing rate from 125 nm RRR film scaled to an irradiance of 15 mW cm−2. (b) Difference in the absolute amount of outgassing from a 100 nm RRR film relative to that from a 125 nm RRR film. In (b), the solid blocks represent major outgassed features, and the dashed blocks the minor outgassed features.

Image of FIG. 4.
FIG. 4.

(Color online) Absolute outgassing rate from a 30 nm UL-SiOCH film scaled to an irradiance of 10 mW cm−2: The current work (), and IMEC data (red dashed line, - -; see Ref. 33).

Image of FIG. 5.
FIG. 5.

Absolute outgassing rates from a 15 nm UL-CHO-1 film scaled to an irradiance of 15 mW cm−2.

Image of FIG. 6.
FIG. 6.

(Color online) Relative extent of CH3 +, H3O+, and C2H5 + outgassing from UL-SiOCH for cumulative doses.

Image of FIG. 7.
FIG. 7.

(Color online) Relative outgassing of CH3 +, C2H5 +, and F+ from 125, 100, and 80 nm PMMA and RRR films.

Image of FIG. 8.
FIG. 8.

(Color online) Absolute outgassing rates of PMMA and RRR films of various thickness and 15 nm UL-CHO-1 and UL-CHO-2 films as functions of their respective σabs/DBEPB values.

Image of FIG. 9.
FIG. 9.

(Color online) (a) Total pressure displacements of four photoresists measured in Ref. 35 as functions of their respective σabs/DBEPB values. (b)The values as a function of the carbon density numbers proposed in Ref. 35.

Tables

Generic image for table
TABLE I.

Absolute outgassing rates of PMMA, RRR, and underlayer films upon irradiation at 13.5 nm.

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/content/avs/journal/jvstb/30/5/10.1116/1.4739000
2012-07-27
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Outgassing and photochemical studies of photosensitive films upon irradiation at 13.5 nm
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/5/10.1116/1.4739000
10.1116/1.4739000
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