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Fabrication of 1 Teradot/in.2 CoCrPt bit patterned media and recording performance with a conventional read/write head
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Image of FIG. 1.
FIG. 1.

(Color online) Process flow for BPM disk fabrication. (a) Diagram of material stack on disk. (b) Windows etched into the top 6 nm thick Si hard mask. (c) The disk with patterned windows coated with an additional 1–3 nm carbon layer. (d) e-beam patterned dots inside the Si window. (e) Etched carbon hard mask pillars inside the Si window. (f) Etched 6 nm height CoCrPt pillars inside the window with mask present. (g) BPM pattern with hard mask stripped.

Image of FIG. 2.
FIG. 2.

(Color online) Etched windows in Si hard mask: (a) Candella image of disk. (b) Tapping mode AFM image of the Si window with step height of 8 nm. The unit of the z-axis is 10 nm.

Image of FIG. 3.
FIG. 3.

Data showing HSQ Thickness at different dilutions in methyl isobutyl ketone.

Image of FIG. 4.
FIG. 4.

Lithographic performance comparing two thicknesses of HSQ exposed with the same dose on identical disk material stacks. (a) AFM height map of patterned 9.5 nm thick HSQ as developed. (b) SEM micrograph of the HSQ pattern in (a) etched into the carbon hard mask. (c) SEM micrograph of patterned 7.5 nm thick HSQ pattern etched into the carbon hard mask.

Image of FIG. 5.
FIG. 5.

AFM height micrograph of etched carbon hard mask, patterned with 8.5 nm thick HSQ, plasma hardened, and etched with a 140 V bias.

Image of FIG. 6.
FIG. 6.

(Color online) Etched CoCrPt magnetic media. (a) and (b) Results of Silvaco Monte Carlo model etching process simulation for CoPtCr. Initially, the carbon hard mask was 20 nm thick. (c) and (d) TEM cross sectional micrographs of etched magnetic media. (c) The carbon hard mask was present. (d) The carbon hard mask was removed.

Image of FIG. 7.
FIG. 7.

Top–down SEM micrograph of patterned media analyzed in Table I.

Image of FIG. 8.
FIG. 8.

(Color online) (a)–(c) SEM micrographs of patterned magnetic islands with increasing e-beam patterning dose. (d) Corresponding magnetic coercivity, magnetic switching field distribution width, and relative magnetic switching field distribution width vs e-beam patterning dose.

Image of FIG. 9.
FIG. 9.

(Color online) Diagram of shingled recording on bit patterned media. Head moves from the left to the right to record the data.

Image of FIG. 10.
FIG. 10.

Effect of BPM defects on recording performance, left column (a)–(d) shows the write rate vs position of center of head from the target track for a matrix of four doses on one sample. The open circles are the data and the solid lines are the best fit to the data. The right column (e)–(h) shows the corresponding micrographs of the BPM measured in (a)–(d). The doses were: (a) and (e) 5870 μC/cm2; (b) and (f) 6050 μC/cm2; (c) and (g) 6415 μC/cm2; (d) and (h) 6608 μC/cm2.


Generic image for table

Analysis of dot placement and size variation in micrograph of Fig. 7.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of 1 Teradot/in.2 CoCrPt bit patterned media and recording performance with a conventional read/write head