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Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
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10.1116/1.4758772
/content/avs/journal/jvstb/30/6/10.1116/1.4758772
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/6/10.1116/1.4758772
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) (a) Example of the absorbance in the region of 1600 to 1850 cm−1. The black line is the experimental data, and the gray line (online color: red) is the fit, with each of the dashed lines being an individual peak fit by a Voigt distribution; (b) The progressive change of the same region is plotted as a function of exposure dose.

Image of FIG. 2.
FIG. 2.

(Color online) (a) Deprotection of the open source resist exposed at ArF, for different postexposure bakes, as a function of the film thickness loss. The red dashed line shows the threshold below which the FTL is not significant. (b) Both the deprotection and the FTL as a function of the exposure dose at 100 °C PEB. Nominal resist thickness was 75 nm.

Image of FIG. 3.
FIG. 3.

(Color online) Deprotection plotted as a function of the film thickness loss for a state-of-the-art commercially available resist exposed in EUV (60 nm initial resist thickness). A logarithmic fit is shown by the dashed red line: y = 0.54 ln(x + 1).

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/content/avs/journal/jvstb/30/6/10.1116/1.4758772
2012-10-15
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/6/10.1116/1.4758772
10.1116/1.4758772
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