Schematic of electrodes and MWNT before eutectic melting. The SiO2 layer is 500 nm thick.
SEM image of the cross section of the electrode and AFM images of the electrode surface (a) before and (b) after annealing. The boundary between the Au and Al layers is seen before annealing but not after annealing in the cross section images. After annealing, the electrode surface is covered with large grains. The size of AFM images is 1 × 1 μm.
AFM images of (a) MWNT/Au contact and (b) MWNT/Au–Al contact.
(a) I–V curves obtained from the representative MWNT/Au/Al sample before annealing and after annealing (i.e., MWNT/Au–Al contact). Bias voltage was applied between two electrodes. (b) Current–voltage curve with error bars averaged over 30 MWNT/Au contacts and (c) 30 MWNT/Au–Al contacts.
Current–voltage curves obtained from MWNT/Au–Al alloy before sonicating and after sonicating for 90 s. Bias voltage was applied between two MWNT/Au–Al contacts.
Au ion detection of (a) SWNT/Au contact sensor and (b) SWNT/Au–Al contact sensor. Washing time was 3 min and bias voltage was 10 mV.
AFM image showing (a) MWNT/Au–Al contact and (b) MWNT cross junction fabricated by adding a second electrode pair bridged by MWNT to the substrate shown in (a).
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