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Optical properties of TaTe2O7 thin films as absorber materials for extreme ultraviolet lithography binary masks
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10.1116/1.4766879
/content/avs/journal/jvstb/30/6/10.1116/1.4766879
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/6/10.1116/1.4766879
/content/avs/journal/jvstb/30/6/10.1116/1.4766879
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/content/avs/journal/jvstb/30/6/10.1116/1.4766879
2012-11-26
2015-04-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Optical properties of TaTe2O7 thin films as absorber materials for extreme ultraviolet lithography binary masks
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/6/10.1116/1.4766879
10.1116/1.4766879
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