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Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
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10.1116/1.4767237
/content/avs/journal/jvstb/30/6/10.1116/1.4767237
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/6/10.1116/1.4767237
/content/avs/journal/jvstb/30/6/10.1116/1.4767237
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/content/avs/journal/jvstb/30/6/10.1116/1.4767237
2012-11-26
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/30/6/10.1116/1.4767237
10.1116/1.4767237
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