Schematic diagram of the fabrication process.
(Color online) Etching rate of ITO as a function of the tilt angle. The definition of the tilt angle is shown in the inset.
SEM images of the bump and pit structures with a period of 750 nm. These were etched at different tilt angles using Cr and PMMA masks, respectively.
Etching rate of different materials as a function of tilt angle. Structures shown in the SEM images were etched at a tilt angle of 0° with a period of 550 nm.
(a) SEM images of ITO bumps with periods of 350, 450, 550, and 750 nm, etched at a tilt angle of 20°, using a Cr mask. (b) SEM images of ITO pits with periods of 350, 450, 550, and 750 nm, etched at a tilt angle of 20°, using a PMMA mask. (c) SEM images of bumps over-etched at a tilt angle of 40° for 10 min. (d) SEM images of pits over-etched at a tilt angle of 40° for 14 min. The scale bar is 500 nm.
Article metrics loading...
Full text loading...