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Chamber conditioning process development for improved inductively coupled plasma reactive ion etching of GaAs/AlGaAs materials
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10.1116/1.4792839
/content/avs/journal/jvstb/31/2/10.1116/1.4792839
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/2/10.1116/1.4792839
/content/avs/journal/jvstb/31/2/10.1116/1.4792839
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/content/avs/journal/jvstb/31/2/10.1116/1.4792839
2013-02-19
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Chamber conditioning process development for improved inductively coupled plasma reactive ion etching of GaAs/AlGaAs materials
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/2/10.1116/1.4792839
10.1116/1.4792839
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