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Etching selectivity of indium tin oxide to photoresist in high density chlorine- and ethylene-containing plasmas
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10.1116/1.4795209
/content/avs/journal/jvstb/31/2/10.1116/1.4795209
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/2/10.1116/1.4795209
/content/avs/journal/jvstb/31/2/10.1116/1.4795209
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/content/avs/journal/jvstb/31/2/10.1116/1.4795209
2013-03-13
2015-05-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etching selectivity of indium tin oxide to photoresist in high density chlorine- and ethylene-containing plasmas
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/2/10.1116/1.4795209
10.1116/1.4795209
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