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Optimization of electron beam induced deposition process for the fabrication of diode-like Pt/SiO2/W devices
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10.1116/1.4811824
/content/avs/journal/jvstb/31/4/10.1116/1.4811824
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/4/10.1116/1.4811824
/content/avs/journal/jvstb/31/4/10.1116/1.4811824
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/content/avs/journal/jvstb/31/4/10.1116/1.4811824
2013-06-25
2014-11-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Optimization of electron beam induced deposition process for the fabrication of diode-like Pt/SiO2/W devices
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/4/10.1116/1.4811824
10.1116/1.4811824
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