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Variation of backscatter electron intensity
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10.1116/1.4818881
/content/avs/journal/jvstb/31/6/10.1116/1.4818881
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4818881

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic of the pattern used to measure the relative dose contribution of backscattered electrons. The pattern consists of intersecting lines and a torus with inner radius, , and outer radius, . The pattern is exposed, developed, and the height of the resist exposed at the center of the intersecting lines is measured. This height is used as a means to quantify the electron interactions with a nanoscale volume of the resist on the surface of the substrate.

Image of FIG. 2.
FIG. 2.

(Color online) Example graph showing the expected relation between the normalized resist height and the torus dose. The solid lines represent the normalized resist height for a given write dose. The direct write dose of the lines is highest for 1 and lowest for 5. Subsequently, the torus doses need to be increased as the line dose is decreased to achieve the same resist height.

Image of FIG. 3.
FIG. 3.

(Color online) Graph of the normalized resist height as a function of the direct write dose. The circles are the raw data. The solid line represents a least squares fit of the data to a saturating exponential function, characterized by two parameters: a minimum printing dose below which no features are left after development and a slope of the curve related to the sensitivity of the resist.

Image of FIG. 4.
FIG. 4.

(Color online) Graph showing the normalized resist height as a function of the modified torus dose for seven different write doses. The symbols represent the measured data. The solid lines represent a least squares fit of the data to a saturating exponential function. The solid horizontal line at 0.5 normalized height is used to visualize the individual values for the different curves. These values are used to calculate the relative backscattered dose contribution, , for the different curves.

Image of FIG. 5.
FIG. 5.

(Color online) Graph showing the relative backscattered dose contribution, , as a function of the percentage normalized backscatter dose contribution. The symbols represent the calculated values for . The solid lines around the symbols represent the calculated error for the corresponding values of . The solid line represents a continuous function used to extrapolate values for points in between the measured data points.

Tables

Generic image for table
TABLE I.

Fit parameters for the raw data for the contrast curve and the different line doses. The units of , , Δ , , Δ, and 0.5 h are C/cm. and Δ are dimensionless parameters.

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/content/avs/journal/jvstb/31/6/10.1116/1.4818881
2013-08-27
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Variation of backscatter electron intensity
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4818881
10.1116/1.4818881
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