1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
Rent:
Rent this article for
USD
10.1116/1.4822016
/content/avs/journal/jvstb/31/6/10.1116/1.4822016
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4822016
/content/avs/journal/jvstb/31/6/10.1116/1.4822016
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/avs/journal/jvstb/31/6/10.1116/1.4822016
2013-09-25
2014-09-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4822016
10.1116/1.4822016
SEARCH_EXPAND_ITEM