1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system
Rent:
Rent this article for
USD
10.1116/1.4826344
/content/avs/journal/jvstb/31/6/10.1116/1.4826344
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4826344
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematic of the experimental setup for extreme ultraviolet Talbot coherent lithography. The collimated coherent extreme ultraviolet beam illuminates a periodic transparent mask that renders a Talbot image at the Talbot distance, where a photoresist-coated substrate is placed.

Image of FIG. 2.
FIG. 2.

(Color online) Free standing Talbot masks fabricated in a silicon nitride membrane. The mask is composed of 5 × 5 m2 tiles replicated 10 000 times in a square matrix. About 20% of the tiles have broken bridges (shown in the image). (a) Mask with tiles composed of 500 nm slits with a periodicity of 600 nm. (b) SEM image of a self-standing mask with tiles composed of 300 nm holes in 1.2 m period. (c) Cross section diagram of the free-standing mask.

Image of FIG. 3.
FIG. 3.

(Color online) Talbot masks supported on a silicon membrane: (a)SEM image of a mask with elbow shaped patterns with 550 nm wide lines and period 1.2 m. (b) SEM image of a mask with 500 nm isolated lines and a period of 1 m. (c) Cross section scheme of the mask supported on a Si membrane.

Image of FIG. 4.
FIG. 4.

(a) SEM image of a self-standing mask with approximately 20% defective tiles. The mask is also depicted in Fig. 2(a) . (b) Exposed pattern in a 60 nm thick HSQ layer using the mask shown in (a). The HSQ pattern (bright lines in the image) on top of the gold substrate is free of defects. (c)SEM image of the pattern transferred to 100 nm thick gold using anisotropic ion beam etching.

Image of FIG. 5.
FIG. 5.

(Color online) Examples of periodic structures fabricated in metal-coated substrates. (a) SEM and AFM (inset) images of Au pillars 80 nm in height and 300 nm FWHM diameter obtained with the mask shown in Fig. 2(b) . (b) SEM image of Au elbows 100 nm in height and 1.2 m in period duplicated from mask shown in Fig. 3(a) . (c) SEM image of periodic and isolated lines in 120 nm thick Ag duplicated from mask shown in Fig. 3(b) .

Image of FIG. 6.
FIG. 6.

(Color online) SEM images of free-standing masks fabricated in silicon nitride membranes. (a) Mask with 100 nm dense lines. (b) Mask with 75 nm dense lines. Both masks have a periodicity of the tiling of 2.85 m and are composed of 180 × 180 tiles covering a surface of 512 × 512 m2. The tiles have extra 40 nm supporting bridges along the direction of the slits to strengthen the self-standing structure.

Image of FIG. 7.
FIG. 7.

(Color online) Reduction of the feature size by two overlaid exposures. (a) AFM images of 50 nm/150 nm gratings in photoresist obtained with the mask shown in Fig. 6(a) . The inset is a cross section of the AFM profile. (b) SEM image of 40 nm/110 nm line and spaces in photoresist. The inset is a cross section of the AFM profile. Figure 7(b) is a print obtained with the mask shown in Fig. 6(b) . (c) Higher magnification AFM scan of one tile of the print shown in Fig. 7(a) .

Loading

Article metrics loading...

/content/avs/journal/jvstb/31/6/10.1116/1.4826344
2013-10-21
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4826344
10.1116/1.4826344
SEARCH_EXPAND_ITEM