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Active-matrix nanocrystalline Si electron emitter array with a function of electronic aberration correction for massively parallel electron beam direct-write lithography: Electron emission and pattern transfer characteristics
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10.1116/1.4827819
/content/avs/journal/jvstb/31/6/10.1116/1.4827819
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4827819
/content/avs/journal/jvstb/31/6/10.1116/1.4827819
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/content/avs/journal/jvstb/31/6/10.1116/1.4827819
2013-10-31
2015-05-04
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Active-matrix nanocrystalline Si electron emitter array with a function of electronic aberration correction for massively parallel electron beam direct-write lithography: Electron emission and pattern transfer characteristics
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/31/6/10.1116/1.4827819
10.1116/1.4827819
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