(Color online) Schematic of fabricated thermal chemical vapor deposition system.
SEM image of emitter tips: (a) Si tip and (b) BN-coated Si tip.
IR spectra of BN film deposited on Fe-Si, Ni-Si, and Si.
IR spectra of BN films formed on Fe-coated Si with different Fe thicknesses (4, 11, and 20 nm).
IR spectra of BN film deposited at different temperatures (650, 800, and 940 °C).
(Color online) X-ray diffraction of the BN film.
(Color online) Ultraviolet photoelectron spectroscopy spectrum of the BN film. The inset shows the band structure of the BN film.
(Color online) Field emission characteristics of the BN-coated Si tips and the uncoated Si tip.
(Color online) FN plots of the I–V characteristics.
Synthesis parameters of BN thin films.
Parameters of field emitters and field emission properties. The Et is the threshold electric field and is the field enhancement factor.
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