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Physical and electrical characterization of Ce-HfO2 thin films deposited by thermal atomic layer deposition
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10.1116/1.4826174
/content/avs/journal/jvstb/32/3/10.1116/1.4826174
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/32/3/10.1116/1.4826174
/content/avs/journal/jvstb/32/3/10.1116/1.4826174
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/content/avs/journal/jvstb/32/3/10.1116/1.4826174
2013-10-21
2014-08-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Physical and electrical characterization of Ce-HfO2 thin films deposited by thermal atomic layer deposition
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/32/3/10.1116/1.4826174
10.1116/1.4826174
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