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Low‐temperature growth of silicon dioxide films: A study of chemical bonding by ellipsometry and infrared spectroscopy
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10.1116/1.583944
/content/avs/journal/jvstb/5/2/10.1116/1.583944
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/5/2/10.1116/1.583944
/content/avs/journal/jvstb/5/2/10.1116/1.583944
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/content/avs/journal/jvstb/5/2/10.1116/1.583944
1987-03-01
2014-10-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low‐temperature growth of silicon dioxide films: A study of chemical bonding by ellipsometry and infrared spectroscopy
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/5/2/10.1116/1.583944
10.1116/1.583944
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