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An optical‐heterodyne alignment technique for quarter‐micron x‐ray lithography
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10.1116/1.584659
/content/avs/journal/jvstb/7/6/10.1116/1.584659
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/7/6/10.1116/1.584659
/content/avs/journal/jvstb/7/6/10.1116/1.584659
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/content/avs/journal/jvstb/7/6/10.1116/1.584659
1989-11-01
2014-12-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: An optical‐heterodyne alignment technique for quarter‐micron x‐ray lithography
http://aip.metastore.ingenta.com/content/avs/journal/jvstb/7/6/10.1116/1.584659
10.1116/1.584659
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