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Drilling of glass by excimer laser mask projection technique
1.B. Wolff and P. Simon, “Nanosecond and femtosecond excimer laser ablation of fused silica,” Appl. Phys. A: Solids Surf. 54, 363–368 (1992).
2.R. Nowak, S. Metev, and G. Sepold, “Excimer laser processing of BK7 and BGG31 glasses,” Glastech Ber. 66, 227–233 (1993).
3.C. Buerhop, N. Lutz, R. Weißmann, and G. Tomandi, “Surface treatment of glass and ceramics using XeCl excimer laser radiation,” Glastech. Ber. 66, 61–67 (1993).
4.H. Exner, B. Keiper, and P. Meja, Microstructuring of materials by pulsed laser focusing and projection technique. Presented at Photonics West ‘99, 23–29 January 1999, San Jose, California, published in “Laser Applications in Microelectronic and Optoelectronic Manufacturing IV,” edited by Jan J. Dubowski, H. Helvajian, E. W. Kreutz, and K. Sugioka, Proc. SPIE 3618, 340–347 (1999).
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