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Periodic antireflection surface structure fabricated on silicon by four-beam laser interference lithography
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10.2351/1.4849715
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    Affiliations:
    1 CNM and JR3CN, Changchun University of Science and Technology, Changchun 130022, China and CHO, Changchun Observatory, National Astronomical Observatory, CAS, Changchun 130117, China
    2 CNM and JR3CN, Changchun University of Science and Technology, Changchun 130022, China and JR3CN, University of Bedfordshire, Luton LU1 3JU, United Kingdom
    3 CNM and JR3CN, Changchun University of Science and Technology, Changchun 130022, China
    J. Laser Appl. 26, 012010 (2014); http://dx.doi.org/10.2351/1.4849715
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/content/lia/journal/jla/26/1/10.2351/1.4849715
2013-12-31
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Periodic antireflection surface structure fabricated on silicon by four-beam laser interference lithography
http://aip.metastore.ingenta.com/content/lia/journal/jla/26/1/10.2351/1.4849715
10.2351/1.4849715
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