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Articles

Analysis of controlled mixed-phase (amorphous+microcrystalline) silicon thin films by real time spectroscopic ellipsometry
N. J. Podraza, Jing Li, C. R. Wronski, E. C. Dickey, and R. W. Collins
pp. 1255-1259
Abstract    Full Text: [ HTML Sectioned HTML   PDF (435 kB)  ]    Order

Characterizations of Ga-doped ZnO films on Si (111) prepared by atmospheric pressure metal-organic chemical vapor deposition
Yen-Chin Huang, Zhen-Yu Li, Li-Wei Weng, Wu-Yih Uen, Shan-Ming Lan, Sen-Mao Liao, Tai-Yuan Lin, Yu-Hsiang Huang, Jian-Wen Chen, Tsun-Neng Yang, and Chin-Chen Chiang
pp. 1260-1265
Abstract    Full Text: [ HTML Sectioned HTML   PDF (533 kB)  ]    Order

Effects of Si capping layers on the properties of ultrathin Co/Ir(111) films
J. S. Tsay, Y. C. Liou, C. M. Chen, and W. Y. Chan
pp. 1266-1270
Abstract    Full Text: [ HTML Sectioned HTML   PDF (181 kB)  ]    Order

Kinetic modeling of the effect of electron beam pulse duration on abatement of carbon tetrafluoride using O₂ as an additive gas
Susumu Kato, Isao Okuda, Eiichi Takahashi, and Yuji Matsumoto
pp. 1271-1274
Abstract    Full Text: [ HTML Sectioned HTML   PDF (243 kB)  ]    Order

Effect of magnetic field strength on deposition rate and energy flux in a dc magnetron sputtering system
Samuel D. Ekpe, Francisco J. Jimenez, David J. Field, Martin J. Davis, and Steven K. Dew
pp. 1275-1280
Abstract    Full Text: [ HTML Sectioned HTML   PDF (561 kB)  ]    Order

Time of flight secondary ion mass spectroscopy studies of poly(allyl methacrylate-g-dimethylsiloxane) copolymers using cryogenic sample handling techniques: Effects of hydration on surface chemical structure and surface chain length distribution
Daniel J. Hook, Lu Chen, Paul L. Valint, Jr., and Joseph A. Gardella, Jr.
pp. 1281-1288
Abstract    Full Text: [ HTML Sectioned HTML   PDF (628 kB)  ]    Order

Mechanisms for plasma etching of HfO₂ gate stacks with Si selectivity and photoresist trimming
Juline Shoeb and Mark J. Kushner
pp. 1289-1302
Abstract    Full Text: [ HTML Sectioned HTML   PDF (1158 kB)  ]    Order

Development of copper-alloy Matsumoto–Ohtsuka-type vacuum flanges and its application to accelerator beam pipes
Y. Suetsugu, M. Shirai, M. Ohtsuka, T. Nishidono, K. Watanabe, Y. Suzuki, M. Tsuchiya, A. Yonemoto, K. Sennyu, and H. Hara
pp. 1303-1309
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Effects of pulsed sputtering frequency on the uniformity of Al:ZnO's transparent conductive oxide properties for solar cell applications
Wonkyun Yang and Junghoon Joo
pp. 1310-1315
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Zn-doped CuAlS₂ transparent p-type conductive thin films deposited by pulsed plasma deposition
Ming Yang, Yinghua Wang, Guifeng Li, Zhan Shi, and Qun Zhang
pp. 1316-1319
Abstract    Full Text: [ HTML Sectioned HTML   PDF (417 kB)  ]    Order

Dry-etching properties of TiN for metal/high-k gate stack using BCl₃-based inductively coupled plasma
Dong-Pyo Kim, Xue Yang, Jong-Chang Woo, Doo-Seung Um, and Chang-Il Kim
pp. 1320-1325
Abstract    Full Text: [ HTML Sectioned HTML   PDF (337 kB)  ]    Order

Modeling of the angular dependence of plasma etching
Wei Guo and Herbert H. Sawin
pp. 1326-1336
Abstract    Full Text: [ HTML Sectioned HTML   PDF (745 kB)  ]    Order

Ferroelectric polarization dependent interactions at Pd–LiNbO₃(0001) interfaces
Mosha H. Zhao, Dawn A. Bonnell, and John M. Vohs
pp. 1337-1342
Abstract    Full Text: [ HTML Sectioned HTML   PDF (496 kB)  ]    Order

UV detection based on a ZnO/LiNbO₃ layered surface acoustic wave oscillator circuit
Ching-Liang Wei, Ying-Chung Chen, Jiun-Lin Fu, Kuo-Sheng Kao, Da-Long Cheng, and Chien-Chuan Cheng
pp. 1343-1346
Abstract    Full Text: [ HTML Sectioned HTML   PDF (568 kB)  ]    Order

Synthesis and hydrogen gas sensing properties of ZnO wirelike thin films
Nguyen Le Hung, Eunseong Ahn, Seongyong Park, Hooncheol Jung, Hyojin Kim, Soon-Ku Hong, Dojin Kim, and Chanyong Hwang
pp. 1347-1351
Abstract    Full Text: [ HTML Sectioned HTML   PDF (405 kB)  ]    Order

Transmission electron microscopy specimen preparation perpendicular to the long axis of high aspect ratio features
R. B. Irwin, A. Anciso, P. J. Jones, A. L. Glenn, B. L. Williams, S. Sridhar, and S. Arshad
pp. 1352-1359
Abstract    Full Text: [ HTML Sectioned HTML   PDF (555 kB)  ]    Order

Structure and properties of ZrN doped diamondlike carbon films prepared by pulsed bias arc ion plating
H. K. Li, G. Q. Lin, and C. Dong
pp. 1360-1364
Abstract    Full Text: [ HTML Sectioned HTML   PDF (524 kB)  ]    Order

Analysis of carbon in SrTiO₃ grown by hybrid molecular beam epitaxy
Bharat Jalan, Joël Cagnon, Thomas E. Mates, and Susanne Stemmer
pp. 1365-1368
Abstract    Full Text: [ HTML Sectioned HTML   PDF (473 kB)  ]    Order

Effects of type of reactor, crystallinity of SiC, and NF₃ gas pressure on etching rate and smoothness of SiC surface using NF₃ gas plasma
A. Tasaka, H. Yamada, T. Nonoyama, T. Kanatani, Y. Kotaka, T. Tojo, and M. Inaba
pp. 1369-1376
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Simulation of gas flow through tubes of finite length over the whole range of rarefaction for various pressure drop ratios
S. Varoutis, D. Valougeorgis, and F. Sharipov
pp. 1377-1391
Abstract    Full Text: [ HTML Sectioned HTML   PDF (1906 kB)  ]    Order

Preferential growth of helium-doped Ti films deposited by magnetron sputtering
Lei Zhang, L. Q. Shi, Z. J. He, B. Zhang, and L. B. Wang
pp. 1392-1399
Abstract    Full Text: [ HTML Sectioned HTML   PDF (966 kB)  ]    Order