Josephson properties of Nb3Ge/oxide/Pb tunnel junctions
Appl. Phys. Lett. 44, 559 (1984); doi:10.1063/1.94802
Issue Date: 1 March 1984
You are not logged in to this journal. Log in
Nb3Ge/oxide/Pb Josephson tunnel junctions have been fabricated on magnetron-sputtered Nb3Ge thin films using standard photolithography and a CF4 plasma cleaning technique. Their Josephson properties have also been investigated. High-quality junctions with a well-defined large gap (~5 mV) and low excess conductance (Vm=35 mV) can be obtained by adopting large-grained high-Tc films. These junctions are found to have an Nb3Ge magnetic penetration depth of less than 200 nm, and a specific capacitance a little lower than that for Nb/Nb oxide/Pb junctions.
Applied Physics Letters is copyrighted by The American Institute of Physics.
| History: | Received 28 November 1983; accepted 19 December 1983 |
| Permalink: |
http://link.aip.org/link/?APPLAB/44/559/1 |
KEYWORDS and PACS
sputtering,
magnetrons,
fabrication,
josephson junctions,
tunnel effect,
niobium compounds,
germanium compounds,
penetration depth,
superconductivity,
electrical properties,
lead,
oxides,
thin films,
capacitance,
electric potential,
energy gap
- 74.50.+r
Superconductivity Proximity effects, tunnelling phenomena, and Josephson effects - 85.25.+k
Electrical and magnetic devices Superconducting devices; superconducting magnets - 73.60.Ka
Electronic structure and electrical properties of surfaces, interfaces, and thin films Electronic properties of thin films Superconducting films - YEAR: 1984
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (12)
For access to fully linked references, you need to log in.
For access to fully linked references, you need to Log in.
- J. M. Rowell and P. H. Schmidt, Appl. Phys. Lett. 29, 622 (1976).
- D. F. Moore, R. B. Zubeck, J. M. Rowell, and M. R. Beasley, Phys. Rev. B 20, 2721 (1979).
- R. H. Buitorago, A. M. Goldman, L. E. Toth, and R. Cantor,
IEEE Trans. Magn. MAG-15, 589 (1979 ). - K. E. Kihlstrom and T. H. Geballe, Phys. Rev. B 24, 4101 (1981).
- K. E. Kihlstrom, R. H. Hammond, J. Talvachio, T. H. Gaballe, A. K. Green, and Victor Rehn, J. Appl. Phys. 53, 8907 (1982).
- H. Ihara, Y. Kimura, H. Okumura, and S. Gonda,
IEEE Trans. Magn. MAG-19, 938 (1983 ). - K. Tanabe, Y. Katoh, and O. Michikami, Appl. Phys. Lett. 43, 603 (1983).
- K. Tanabe and O. Michikami,
Jpn. J. Appl. Phys. 20, L359 (1981 ). - S. Kubo, K. Nakamura, and M. Igarashi,
Jpn. J. Appl. Phys. 21, 601 (1982 ). - R. E. Howard, D. A. Rudman, and M. R. Beasley, Appl. Phys. Lett. 33, 671 (1978).
- S. Basavaiah and J. H. Greiner, J. Appl. Phys. 47, 4201 (1976).
- H. Asano, K. Nakamura, Y. Maeda, and O. Mihikami (unpublished).







