Microscopic model for the ablative photodecomposition of polymers by far-ultraviolet radiation (193 nm)
Appl. Phys. Lett. 44, 849 (1984); doi:10.1063/1.94947
Issue Date: 1 May 1984
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Short pulses of far-ultraviolet (193 nm) laser radiation are capable of etching organic polymer films without melting the remaining sample. The mechanism proposed for this ablative photodecomposition attributes ablation to the increase in volume that accompanies the photolysis of the polymer. A model of the microscopic process is presented here. The predictions of the model include ablation without melting, a mean perpendicular ejection velocity of 1300 m/s, and an angular distribution of the ablated material which has a narrow peak normal to the surface.
Applied Physics Letters is copyrighted by The American Institute of Physics.
| History: | Received 7 November 1983; accepted 16 February 1984 |
| Permalink: |
http://link.aip.org/link/?APPLAB/44/849/1 |
KEYWORDS and PACS
ablation,
etching,
decomposition,
photon collisions,
photolysis,
polymers,
ultraviolet radiation,
photodissociation,
laser&minus,
radiation heating
- 79.20.Ds
Electron and ion emission by liquids and solids; impact phenomena Impact phenomena (including electron spectra and sputtering) Laser-light impact phenomena - 81.60.Jw
Materials science Corrosion, oxidation, and surface treatments Polymers - 82.30.Lp
Physical chemistry Specific chemical reactions; reaction mechanisms Decomposition reactions (pyrolysis, dissociation, and group ejection) - 82.50.-m
Physical chemistry Photochemistry and radiation chemistry - YEAR: 1984
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (9)
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