Applied Physics Letters
   
 
 
 
Previous Article
Increased optical damage resistance in lithium niobate
We have confirmed greatly improved resistance to photorefractive damage in compositions of lithium niobate containing 4.5 at. % MgO or more. Holographic diffraction measurements of photorefraction dem...
Next Article
Polar glass ceramics for sonar transducers
Glass ceramics are shown in this study to be a new class of transduction materials for application in sonar transducers. It is found that glass ceramics of Ba2TiSi2O8 have high hydrostatic voltage sen...

Microscopic model for the ablative photodecomposition of polymers by far-ultraviolet radiation (193 nm)

Appl. Phys. Lett. 44, 849 (1984); doi:10.1063/1.94947

Issue Date: 1 May 1984

You are not logged in to this journal. Log in

Barbara J. Garrison
Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802

R. Srinivasan
IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
Short pulses of far-ultraviolet (193 nm) laser radiation are capable of etching organic polymer films without melting the remaining sample. The mechanism proposed for this ablative photodecomposition attributes ablation to the increase in volume that accompanies the photolysis of the polymer. A model of the microscopic process is presented here. The predictions of the model include ablation without melting, a mean perpendicular ejection velocity of 1300 m/s, and an angular distribution of the ablated material which has a narrow peak normal to the surface. Applied Physics Letters is copyrighted by The American Institute of Physics.
History: Received 7 November 1983; accepted 16 February 1984
Permalink: http://link.aip.org/link/?APPLAB/44/849/1
BUY THIS ARTICLE   (US$28)
Download PDF (293 kB) View Cart

KEYWORDS and PACS

Keywords
PACS
  • 79.20.Ds
    Electron and ion emission by liquids and solids; impact phenomena Impact phenomena (including electron spectra and sputtering) Laser-light impact phenomena
  • 81.60.Jw
    Materials science Corrosion, oxidation, and surface treatments Polymers
  • 82.30.Lp
    Physical chemistry Specific chemical reactions; reaction mechanisms Decomposition reactions (pyrolysis, dissociation, and group ejection)
  • 82.50.-m
    Physical chemistry Photochemistry and radiation chemistry
  • YEAR: 1984

RELATED DATABASES


To view database links for this article,
you need to log in.
To view database links for this article,
you need to log in.

PUBLICATION DATA

ISSN:
0003-6951 (print)   1077-3118 (online)
Publisher:
AIP is a member of CrossRef AIP

REFERENCES (9)

For access to fully linked references, you need to log in. For access to fully linked references, you need to Log in.
  1. R. Srinivasan and V. Mayne-Banton, Appl. Phys. Lett. 41, 576 (1982);
  2. J. E. Andrew, P. E. Dyer, D. Forster, and P. H. Key, Appl. Phys. Lett. 43, 717 (1983).
  3. R. Srinivasan and W. J. Leigh, J. Am. Chem. Soc. 104, 6784 (1982).
  4. R. Srinivasan, J. Vac. Sci. Tech. B 4, 923 (1983).
  5. Encyclopedia of Polymer Science and Technology (Interscience, New York, 1964), Vols. 3–4.
  6. Shu-Huei Liu and R. Srinivasan (unpublished).
  7. R. Srinivasan and B. Braren, J. Polymer. Sci. (in press).
  8. N. Winograd, B. J. Garrison, and D. E. Harrison, Jr., Phys. Rev. Lett. 41, 1120 (1978).
  9. R. A. Gibbs, S. P. Holland, K. E. Foley, B. J. Garrison, and N. Winograd, J. Chem. Phys. 76, 684 (1982).
  10. B. J. Garrison, J. Am. Chem. Soc. 105, 373 (1983).

CITING ARTICLES

For access to citing articles, you need to log in.
For access to citing articles, you need to Log in.