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Preparation of La-modified PbTiO3 thin films on the oxide buffer layers with NaCl-type structure
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Design of three-dimensional photonic crystals at submicron lengthscales

Appl. Phys. Lett. 65, 1466 (1994); doi:10.1063/1.112017

Issue Date: 12 September 1994

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Shanhui Fan, Pierre R. Villeneuve, Robert D. Meade, and J. D. Joannopoulos
Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
We present a new class of periodic dielectric structures designed specifically to be amenable for fabrication at submicron lengthscales. The structures give rise to a sizable 3D photonic band gap and can be fabricated with materials widely used today in optoelectronic devices. They are made of three materials and consist essentially of a layered structure in which a series of cylindrical air holes are etched at normal incidence through the top surface of the structure. Our results demonstrate the existence of a gap as large as 14% of the midgap frequency using Si, SiO2, and air; and 23% using Si and air. Applied Physics Letters is copyrighted by The American Institute of Physics.
History: Received 25 April 1994; accepted 7 July 1994
Permalink: http://link.aip.org/link/?APPLAB/65/1466/1
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KEYWORDS and PACS

Keywords
PACS
  • 42.90.+m
    Optics Other topics in optics
  • 42.82.Cr
    Optics Integrated optics Fabrication techniques; lithography, pattern transfer
  • 68.55.-a
    Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) Thin film growth, structure, and epitaxy
  • YEAR: 1994

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ISSN:
0003-6951 (print)   1077-3118 (online)
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REFERENCES (11)

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