Enhanced tunnel magnetoresistance at high bias voltage in double-barrier planar junctions
Appl. Phys. Lett. 73, 2829 (1998); doi:10.1063/1.122604
Issue Date: 9 November 1998
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Single Co/Al2O3/NiFe and double Co/Al2O3/Co/Al2O3/NiFe planar tunnel junctions were grown by sputtering and subsequently patterned in a four-step process using optical lithography. The Al2O3 barriers are formed by radio frequency plasma oxidation of 1.5 nm aluminum layers. The double junctions exhibit three clear resistance levels depending on the relative configuration of the magnetizations. Both single and double junctions exhibit maximum magnetoresistance (MR) ratios above 10% at room temperature and 20% at 30 K and a decrease of MR with increasing bias voltage. With regard to its low bias value, the MR is reduced by a factor of 2 at 0.26 V for the single junctions and at values above 0.8 V for the double junctions. The decay of the MR of double junctions with bias voltage is significantly slower than expected from two independent junctions in series. ©1998 American Institute of Physics.
| History: | Received 29 July 1998; accepted 10 September 1998 |
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http://link.aip.org/link/?APPLAB/73/2829/1 |
KEYWORDS and PACS
cobalt,
alumina,
nickel alloys,
iron alloys,
giant magnetoresistance,
magnetic multilayers,
sputtered coatings,
photolithography,
tunnelling,
magnetic hysteresis,
MIM structures
- 75.70.Pa
Magnetic properties and materials Magnetic films and multilayers Giant magnetoresistance - 73.50.Jt
Electronic structure and electrical properties of surfaces, interfaces, and thin films Electronic transport phenomena in thin films Galvanomagnetic and other magnetotransport effects (including thermomagnetic effects) - 75.45.+j
Magnetic properties and materials Macroscopic quantum phenomena in magnetic systems - 73.40.Rw
Electronic structure and electrical properties of surfaces, interfaces, and thin films Electronic transport in interface structures Metal
insulator
metal structures
- 85.70.Kh
Electronic and magnetic devices; microelectronics Magnetic devices Magnetic thin film devices: magnetic heads (magnetoresistive, inductive, etc.); domain-motion devices, etc. - 75.60.Ej
Magnetic properties and materials Domain effects, magnetization curves, and hysteresis Magnetization curves, hysteresis, Barkhausen and related effects - YEAR: 1998
RELATED DATABASES
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
REFERENCES (12)
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- J. S. Moodera, L. R. Kinder, T. M. Wong, and R. Meservey, Phys. Rev. Lett. 74, 3273 (1995).
- Y. Lu, R. A. Altman, A. Marley, S. A. Rishton, P. L. Trouilloud, G. Xiao, W. J. Gallagher, and S. S. P. Parkin, Appl. Phys. Lett. 70, 2610 (1997).
- J. M. Daughton, J. Appl. Phys. 81, 3758 (1997).
- J. S. Moodera, J. Nowak, and R. van de Verdonk, Phys. Rev. Lett. 80, 2941 (1998).
- S. T. Chui, Phys. Rev. B 55, 5600 (1997).
- S. Zhang, P. M. Levy, A. C. Marley, and S. S. P. Parkin, Phys. Rev. Lett. 79, 3744 (1997).
- Y. Lu, X. W. Li, G. Xiao, R. A. Altman, W. J. Gallagher, A. Marley, K. Roche, and S. Parkin, J. Appl. Phys. 83, 6515 (1998).
- X. Zhang, B. Z. Li, G. Sun, and F. C. Pu, Phys. Rev. B 56, 5484 (1997).
- M. Watanabe, T. Suemasu, S. Muratake, and M. Asada, Appl. Phys. Lett. 62, 300 (1993).
- L. F. Schelp, A. Fert, F. Fettar, P. Holody, S. F. Lee, J. L. Maurice, F. Petroff, and A. Vaurès, Phys. Rev. B 56, 5747 (1997).
- J. Nassar, M. Hehn, A. Vaurès, F. Petroff, and A. Fert, Appl. Phys. Lett. 73, 698 (1998).
- R. J. M. van de Verdonk, J. Nowak, R. Meservey, J. S. Moodera, and W. J. M. de Jonge, Appl. Phys. Lett. 71, 2839 (1997).







