Solar-blind AlGaN photodiodes with very low cutoff wavelength
Appl. Phys. Lett. 76, 403 (2000); doi:10.1063/1.125768
Issue Date: 24 January 2000
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We report the fabrication and characterization of AlxGa1xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for 5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. ©2000 American Institute of Physics.
| History: | Received 2 September 1999; accepted 23 November 1999 |
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KEYWORDS and PACS
aluminium compounds,
gallium compounds,
III-V semiconductors,
wide band gap semiconductors,
photodiodes,
MOCVD coatings,
semiconductor growth,
semiconductor epitaxial layers
- 73.61.Ey
Electronic structure and electrical properties of surfaces, interfaces, and thin films Electrical properties of specific thin films and layer structures (multilayers, superlattices, quantum wells, wires, and dots) IIIV semiconductors - 78.66.Fd
Optical properties, condensed-matter spectroscopy and other interactions of radiation and particles with condensed matter Optical properties of specific thin films, surfaces, and low-dimensional structures IIIV semiconductors - 85.60.Dw
Electronic and magnetic devices; microelectronics Optoelectronic devices Photodiodes; phototransistors; photoresistors - 81.15.Gh
Materials science Methods of deposition of films and coatings; film growth and epitaxy Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.) - YEAR: 2000
PUBLICATION DATA
0003-6951 (print)
1077-3118 (online)
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